Analytical Approach of Laboratory for the Microelectronics Fabrication
Main Article Content
We describe changes applied to a laboratory course in CMOS (Complementary Metal Oxide Semiconductor) fabrication to improve student learning and student impact (enrolment). The three most important course enhancements are as follows: 1) the use of a 2-mask MOS process, which significantly decreased the time it took students to design, fabricate, and verify the electrical properties of a MOSFET process; 2) the students' use of a semi-custom IC design, which significantly decreased the average design and processing time of previous years; and 3) the creation and implementation of a system of course prerequisites, which allowed a greater number of students to enrol in the course.
How to Cite
Anatoliy Goncharuk, & Ahmed F. Mohamed. (2022). Analytical Approach of Laboratory for the Microelectronics Fabrication. Acta Energetica, (02), 08–14. Retrieved from https://www.actaenergetica.org/index.php/journal/article/view/463